Electrothermal measurements at boundaries including of metal-semiconductor structures ones by scanning thermal microscopy and 3ω method - Université catholique de Lille
Communication Dans Un Congrès Année : 2023

Electrothermal measurements at boundaries including of metal-semiconductor structures ones by scanning thermal microscopy and 3ω method

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hal-04311003 , version 1 (28-11-2023)

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  • HAL Id : hal-04311003 , version 1

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Juan Carlos Acosta Abanto, Mélanie Brouillard, Marc Dewitte, Jean-François Robillard, Nicolas Horny, et al.. Electrothermal measurements at boundaries including of metal-semiconductor structures ones by scanning thermal microscopy and 3ω method. Interface days, Jul 2023, Paris, France. ⟨hal-04311003⟩
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